Technology

Nanoimprint Technologies

As part of our research program we have developed several novel and complex nanoimprint techniques to fabricate large area imprint, 2D and 3D structures, free-standing structures, hybrid patterns and patterns in functional materials. All of these techniques were developed in-house and representative examples are shown below. These complex patterned materials and structures all are designed towards specific industrial and/or commercial applications.



Step and Repeat UV Imprinting


4in Silicon Wafer Level Imprint

4" Wafer Level Imprint


Cross Section View

100nm Line & Space Cross Sectional View


5-field Measurement
5-field Measurement Table

5-field Measurement Across 4" Wafer



Combinatorial-Mold Imprinting


Pixel Separator

T-Bar Structure


Microfludic Channels

Microfludic Channels



Sequential Imprinting


2-Level Hierachical Strcutures on Polycarbonate

2-Level Hierachical Structures on Polycarbonate


3-Level Hierachical Strcutures on Polystyrene

3-Level Hierachical Structures on Polystyrene






Functional Material Imprinting


P3HT

AFM image of 75nm imprinted P3HT


PEDOT

AFM image of 220nm imprinted PEDOT