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Patterning & Fabrication


Sub-10 nm structure for nanoplasmonics


Sub-50 nm structure by superlense technology		  

Patterning and fabrication techniques that are scalable and can be integrated into functional devices or systems.

  • Top-down surface patterning technique - Nanoimprint lithography, e-beam lithography and electroplating

 

  • Bottom-up surface patterning technique - Anodic alumina templating, self-assembly of copolymers, nanoparticles and polyelectrolyte membranes.

 

  • Nanoscale device design and system integration - Nanoplasmonics, superlense and lab-on-chip devices

Applications: New chemical-free and unique functional surfaces for electronics, optoelectronics, photovoltaics, storage media, chemical and biomedical devices.

 
    Plasmonics and Nanoheterostructures Laboratory

Nanoplasmonics enables the mediation of light between the macro-world and nanostructures. Colloidal Semiconductor Nanoheterostructures (CSN) are nanostructures capable of processing light due to its material properties and quantum size confinement. This laboratory explores the integration of nanoplasmonics with CSNs to produce novel, and higher-performance devices than currently available.

Find out more...
    Publications

Selected Patents

Talent
 

Rice Leaf:
Anisotropic wetting
 Rose Petals:
Liquid pinning		 Butterfly Wings:
Structural Color		 Water Strider's Leg:
Superhydrophobic		 Gecko foot:
Dry adhesive
 

To find out more about our Capability Group and some of our Projects,
please view our Research Factsheets.

Key Members:

Capability Group Head: Dr Teng Jinghua
Deputy Head: Dr Karen Chong
Deputy Head: Dr Tan Wui Siew
Deputy Head: Dr Jaslyn Law (Leave of absence)